Chemical etching the wafer cleaning equipment
 WAFER chemical etching automatic washing machine (1) |
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| Body Material |
| PVC、PVCFirewood ... etc plastic material. |
| Sliding mode |
| About sliding door. |
| Tank material |
| Quartz、PVDF、PTFE...And other plastic material. |
| Applicable Process |
| RCA process, wet etching process ... etc. Suitable WAFER: 4 "~8" Si Wafer2 "~6" gallium arsenide (Ⅲ-Ⅴ family) Wafer. |
| Suitable liquid |
| SC1、SC2、DHF...And other various chemical liquid. |
| Control |
| IPC monitoring connection, PLC program control, man-machine interface operation of automatic cleaning robot operating according to different process requirements set multiple cleaning process parameters. |
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WAFER chemical etching automatic washing machines (2) |
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| Body Material |
| PP、PVC、PVCFirewood ... plastic material such as sliding mode: two-stage flip cover. |
| Tank material |
| PP、PVDF、PTFE、Quartz...And other plastic material. |
| Applicable Process |
| RCA process, wet etching process ... etc. Suitable WAFER: 4 "~8" Si Wafer2 "~6" gallium arsenide (Ⅲ-Ⅴ family) Wafer. |
| Suitable liquid |
| SC1、SC2、NaOH、HF...And other various chemical liquid. |
| Control |
| PLC program control, one-touch operation, the man-machine interface operation. |
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Multi-acid etching trough manual washing machine (1) |
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| Body Material |
| PP、PVC、PVCFirewood ... etc plastic material. |
| Sliding mode |
| Two-stage flip cover. |
| Tank material |
| PP, PVDF, PTFE, Quartz ... and other plastic material. |
| Applicable Process |
| RCA process, wet etching process ... etc. Suitable WAFER: 4 "~8" Si Wafer2 "~6" gallium arsenide (Ⅲ-Ⅴ family) Wafer. |
| Suitable liquid |
| SC1, SC2, NaOH, HF ... other chemical liquid. |
| Control |
| PLC program control, one-touch operation, the man-machine interface operation. |
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Multi-acid etching trough manual cleaning machine (2) |
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| Body Material |
| PP, PVC, PVC plastic material fireproof board ... etc.. |
| Sliding mode |
| About sliding door. |
| Tank material |
| PP, PVDF, PTFE, Quartz ... and other plastic material. |
| Applicable Process |
| RCA process, wet etching process ... etc. Suitable WAFER: 4 "~8" Si Wafer2 "~6" gallium arsenide (Ⅲ-Ⅴ family) Wafer. |
| Suitable liquid |
| H2SO4, HCL, NaOH, HF ... and other various chemical liquid. |
| Control |
| PLC program control, one-touch operation, the man-machine interface operation. |
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Multi-slot machine manual SOLVENT |
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| Body Material |
| SUS304, SUS316 ... such as stainless steel plate. |
| Sliding mode |
| Two-stage flip cover, sliding up and down. |
| Tank material |
| SUS304, SUS316, Quartz ... and other related materials. |
| Applicable Process |
| PR stripper process, the organic liquid process ... and other applicable WAFER: 4 "~8" Si Wafer2 "~6" gallium arsenide (Ⅲ-Ⅴ family) Wafer. |
| Suitable liquid |
| Solvent go photoresists, IPA, ACE ... and other organic liquid. |
| Control |
| PLC program control, one-touch operation, the man-machine interface operation. |
| ♦With CO2 automatic fire extinguishing devices. |
